Work Package 1:
LIL-based 3D patterning
Led by Ceit
Participants:
Objectives:
- To realise LIL-based 3D patterning process
- To verify the accuracy of < 500nm and truly 3D nanostructures
Tasks:
Task 1.1 Investigating photo-chemical reaction (led by Ceit)
RI activities: (1) modelling photo-chemical reaction; (2) investigating impacts of diffraction; (3) investigating impacts of exposure/scan.
Training activities: developing knowledge of (1) photo-chemical reaction from both theoretical and practical perspectives, (2) minimising diffraction effects (3) exposure/scan speed control with robotic and automatic control techniques
Task 1.2 Volumetric additive laser interference lithography scanning (led by CUST)
RI activities: (1) modelling VALILS scanning, (2) modelling GALS, (3) investigating influencing factors, (4) investigating wettability and its influence on infiltration with respect to different materials
Training activities: develop knowledge and skills of VLILS and GALS
Task 1.3 Phase-compensation pattern accumulation (led by BED and MU)
RI activities: (1) PPA modelling; (2) phase-compensation
Training activities: developing knowledge and skills of PPA
Task 1.4 Verification (led by DFM and UNIFESP)
RI activities: verifying (1) accuracy, (2) 3D nanostructures with nano-metrology and characterisation
Training activities: developing knowledge and skills of nano-measuring